Deposição de filmes finos de nitreto de zircônio para aplicação em biomateriais

Abstract

Zirconium nitride (ZrN) nanometric films were deposited onto different substrates, in order to study the surface microstructure and also to investigate the electrochemical behavior to obtain a better composition that minimizes corrosion reactions. The thin films were produced by physical vapor deposition (PVD). The influence of the nitrogen partial pressure, deposition time and temperature over the surface properties was studied. Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), nanohardness, scanning electron microscopy (SEM) and corrosion experiments were performed to characterize the ZrN thin films. The thin films properties and microstructure changes according to the deposition parameters. The corrosion against resistance increases with temperature used in the films deposition. Corrosion tests show that ZrN thin films deposited by PVD onto titanium and onto alloy nitinol substrate effectively improve the corrosion resistance.